Conceptual Design for 1.4 Million SF Greenfield Semiconductor Fab
Semiconductor Client
SSOE was contracted by a major semiconductor manufacturer to design a 1,425,000 SF greenfield fabrication facility (Fab). The Fab would be a new addition to the client’s existing campus. Having recently completed the campus-wide master planning, SSOE was well-positioned to resolve the challenges posed during the Conceptual Design phase, including:
- Greenfield “ground-up” Fab design planning for a 341,000 SF building with five levels.
- Routing site utilities through, around, or over an existing Fab without disrupting production or causing excessive vibration.
- Client requirements to keep the Fab level of the new facility at the same elevation as the Fab levels of neighboring existing buildings, complicated by grade changes in the site, and limitations from an adjacent wetland.
- Vehicle access to the new Fab had to be strategically routed around existing structures and wetlands.
- Full Fab development including: sub-utility levels, utility level, Subfab and laterals, 264,450 SF cleanroom manufacturing space, gowning, storage, and connections with adjacent structures.
- Expansion planning for future chemical utility and process utility buildings.
- Detailed analysis for utility requirements to ensure both expanded and new systems would support the intended use for the new Fab.
SSOE provided project leadership, cleanroom, and Subfab expertise while guiding a subconsultant firm through the overall facility design. This Conceptual Design phase was completed within the proposed 12-week time frame, and rolled seamlessly into the Detailed Design phase.
